The essential use of fluorochemicals in lithographic patterning and semiconductor processing

Published on Wednesday, Apr 20, 2022, 10:17am
by Sarah Ravi

Christopher K. Ober, Florian Käfer, Jingyuan Deng, “The essential use of fluorochemicals in lithographic patterning and semiconductor processing,” J. Micro/Nanopattern. Mater. Metrol. 21(1), 010901 (2022), doi: 10.1117/1.JMM.21.1.010901, available at http://dx.doi.org/10.1117/1.JMM.21.1.010901